Today at the IEEE IEDM Conference, TSMC is presenting a paper giving an overview of the initial results it has achieved on its 5nm process. This process is going to be the next step for any customer currently on the N7 or N7P processes as it shares a number design rules between the two. The new N5 process is set to offer a full node increase over the 7nm variants, and uses EUV technology extensively over 10+ layers, reducing the total steps in production over 7nm. The new 5nm process also implements TSMC’s next generation of FinFET technology.

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